BP Does Not Change with Membrane Orientation in Test Apparatus for W660
Given the low burst pressures of recently produced wafers Chris requested I burst pressure test some samples in two different orientations: well side facing away from the positive pressure source and well side facing towards the pressure source. The standard protocol I follow is to test the samples with the well side facing the pressure source. I tested W660 using samples with pinholes. In the figure well side up means the well is facing away from the pressure source, well side down means the well is facing the pressure source.
It seems that there is no difference in membrane strength when the test orientation is changed, at least this is the case for wafer 660.
Agreed. This is probably good news. Thanks Karl.