Manufacturer’s Data
UR Testing
Karl and I went to INT to meet with Mike Connolly and Rick Murante for preliminary discussions on the PFI project. Our role as proposed in the grant is to provide membranes capable of eliminating false positives by using ~20nm pnc-Si to reduce contamination. Here’s a link to an INT video showing their process and prototype. (4…
Presentation jc_9_15_2009_maryna. Paper nano9_30_305304
Kelly & I deposited 100 & 300 nm thick SiO2 films on bare wafers with the P5000 PE-CVD tool at RIT last week. The wafers were then annealed according to JP’s recipe overnight to stabilize the TEOS layer film stress. The stress was measured using the Tencor P2 profilometer by scanning across it before depositing…
On Monday I presented our progress on the hemodialysis project for the Coulter Foundation. They seemed very pleased with our progress and impressed with our team. Its a tough crowd and for the first time, I sensed they had confidence in us. I’ve uploaded my presentation to the blog (PDF; ppt). Their primary points of…
I’ve been working with the AFM recently and have had some success getting images on supported pnc-Si films. Yesterday, I imaged three samples from sc 698: one untreated pnc-Si film and two films coated with aluminum oxide (1.5 nm and 5 nm thickness). Here are the scans (500 nm x 500 nm). The topmost scan…
While Chris and I were in Boston we deposited our membrane stack on a patterned wafer. It was annealed at 1000 C and then etched. Because we didn’t have an accurate deposition rate for Silicon, we overestimated and put down 30 nm (instead of 15 nm). Still, we can see in the TEM that pores…
