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Fibroblasts spreading on glass
I carried out another trial of spreading experiments and following time lapse movies show the spreading of fibroblasts on glass ( @ 37C, in L15 media supplemented with 10% FBS) over a time period of ~7 hrs. Fibroblast spreading on glass 1 Fibroblast spreading on glass 2 Time lapse movies for fibroblasts spreading on pncSi…
The Whitesides Chamber implemented in the McGrath Lab has now successfully generated a steady and linear gradient
ByHenryHi all, After nearly a month of troubleshooting the fabrication of Whitesides Chamber we finally have the capability to generate a steady and linear gradient of molecules. In the presented case, we have generated a gradient of rhodamine 6G (R6G), which is a fluorophore that allows us to visualize and confirm the existence of the…
Large pores in thick membranes
There has been some experimentation recently on trying to form very large pores in thick membranes. We have found that a high temperature anneal (1000 C) along with a fast ramp rate (100 C/s) w/o the susceptor can create these large voids. It seems that the distribution widens as we push the cut-off up. The…
Electrical Characterization of AJA Sputtered Oxide (Initial Experiment)
The electrical properties of 20nm and 50nm thick sputtered oxide is currently being investigated. Capacitance-Voltage (C-V) and Current-Voltage (I-V) tests are achieved by fabricating 200um-4kum diameter capacitor “dots” using Lesker SiO2 targets and flash-evaporated aluminum (CVC). A GCA stepper is also used during photolithography for 5X image reduction. The purpose of the experiment is two-fold:…
Alternate method of ‘nanomembrane’ fabrication
We are proposing a novel method for the fabrication of porous thin-film silicon membranes. It has been shown that metallic nanoparticles on the surface of silicon submerged in a solution of hydrofluoric acid and hydrogen peroxide will bore holes into the silicon. This selective etching occurs because the metal acts as a catalyst in the…
AFM of SiO2 film roughness
Dave did a series of 20nm SiO2 film depositions at different temperatures (constant bias) and gave them to me to AFM. I guess he wanted to see if film roughness changed drastically over the range of ‘room temp – 400C’ in order to investigate this as a potential source of pinholes. I used a new…