Process Flow Update

I was not entirely satisfied with the amount of data that I received from my last burst pressure wafer, so I processed another wafer. This wafer had some yield loss initially, as well as window sizes that were slightly smaller than expected (by about 50 microns). We expect the mechanical strength of the windows to…

The SiO2 coated samples (from W335 & W341) were found completely discolored after 5 days in DMEM (benchtop). Thus, silicon dioxide coating didn’t prevent discoloration as much as the RTP treatment. There’s a need to check the discoloration profile of the SiO2 coated samples within 5 days. Till 24 hrs. there was no discoloration observed….

Josh has been kind enough to fabricate a shadow mask for me to create interdigitated electrodes without the hassle of photolithography and etching. In order to be able to use this method, I want to make sure the produced electrodes are the same or better than the old method. I worry about shadowing effects due…

This is in continuation to the studies that I published here. I used two types of membrane surfaces: nano nitride trenches (the back side of membranes) with pure nitride on the surface, and zero-second-etch nano nitride with a completely intact pncSi cap on the top. These two surfaces basically act as materials with two extreme…

This post summarizes a quick update on 2 different goals: 1) membrane releasing and 2) SU-8 strain reduction. Here you will find basic background on some of the work that has already been conducted and the planned experimental work that will be conducted in conjunction with Bob Carter and Cody Soule (Co-op student). 1. ZnO as…