Last summer, I attempted to modify the surface of SU-8. The purpose of the experiment was to covalently bond poly(ethylene glycol) (PEG) to SU-8, which would be useful when the SU-8 is used as a scaffold on the membranes. The method of surface modification was derived from the attached article, which can be found here. …
Bob and I are trying to determine which wet etch would be appropriate to use to remove the native oxide inside the pores before membrane liftoff. The issue is when removing the native oxide, we will remove part of the membrane. So far, we removed native oxide from bare silicon wafers using 50:1 HF. For…
Bob and I have been busy for the last couple of weeks going through the fabrication process with the hopes of SiO2 membrane liftoff. The fabrication process was similar to the silicon nitride membrane liftoff. The process is shown in the figure below. In the beginning, we started with 9 wafers that had thermal oxide…
Goal: Measure SU-8 shrinkage that have gone through various soft and hard bake conditions To measure the shrinkage, the SU-8 scaffolds needed to be lifted off, but there was some issues. Originally, the SU-8 was spincoated onto an oxide layer, which would be etched away using BOE. The SU-8 had appeared to be disintegrating due…
The overall goal was to see is if it was possible to create a reliable low resolution mask that can be used for crosslinking PEG structures using a laser printer and transparencies sheets. With these masks, I explored to see if there is an effect on the PEG structures when dimensions such as the spacings…
