SiN NP wafer #'s 1029 and 1030 pore size revisions

Our work with permeance and hydraulic permeability tests on the SiN-NP seemed to show that the porosity and pore sizes I had calculated from the STEM images were too high.  I used URnano’s TEM to get better quality images and, as suspected, the pore sizes need to be revised smaller.

Wafer # 1030 (40 s RIE) – ~26% porosity, ~58 nm avg. dia.

Wafer # 1029 (30 s RIE) – ~11% porosity, ~40 nm avg. dia. (calculated by measuring individual pores in ImageJ)

Wafer # 1036  (20 s RIE) – 0% porosity, 0 nm avg. dia.

Wafer # 1037 (10 s RIE) – 0% porosity, 0 nm avg. dia

Sorry for all the confusion.  I’ve gotten a better feel for the STEM recently, and I might be able to get more accurate measurements in the future, but I will probably use either Karen’s or Brian’s TEM for SiN NP inspection in the future.

Stay tuned for revised numbers on wafer # 1019 as well!  🙁

1030
1030 40 s RIE etch
1030
1030 40 s RIE etch
1029
1029 30 s RIE etch
1029 30 s RIE etch
1029 30 s RIE etch
1036 20 s RIE etch
1036 20 s RIE etch

 

1037 10 s RIE etch
1037 10 s RIE etch

 

 

 

 

 

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